BIBLIOGRAPHY 143
212 R. Jinnouchi, E. Toyoda, T. Hatanaka, and Y. Morimoto, First Principles
Calculations on Site-Dependent Dissolution Potentials of Supported and
Unsupported Pt Particles, Journal of Physical Chemistry C, vol. 114,
no. 3, pp. 1755717568, 2010.
213 J. Greeley, Structural eects on trends in the deposition and dissolution
of metal-supported metal adstructures, Electrochimica Acta, vol. 55,
pp. 55455550, Aug. 2010.
214 G. Pötschke, J. Schröder, C. Günther, R. Hwang, and R. Behm, A STM
investigation of the nucleation and growth of thin Cu and Au lms on
Ru(0001), Surface Science Letters, vol. 251-252, no. 0001, p. A346, 1991.
215 J. Schroder, C. Gunther, R. Q. Hwang, and R. J. Behm, A comparative
STM study of the growth of thin Au lms on clean and oxygen-precovered
Ru(0001) surfaces, Ultramicroscopy, vol. 42-44, no. Part A, pp. 475482,
1992.
216 S. Dahl, a. Logadottir, R. Egeberg, J. Larsen, I. Chorkendor, E. Törnqvist,
and J. Nørskov, Role of Steps in N2 Activation on Ru(0001),
Physical Review Letters, vol. 83, no. 9, pp. 18141817, 1999.
217 R. Frydendal, Stability and activity of new mixed oxide catalysts for
the Oxygen Evolution Reaction under acidic conditions, Master's thesis,
Technical University of Denmark, 2012.
218 J. Kohano, Electronic Structure Calculations for Solids and Molecules.
CAMBRIDGE, 1st ed., 2006.
219 D. J. Mowbray, J. I. Martínez, J. Rossmeisl, K. S. Thygesen, K. W. Jacobsen,
and J. K. Nørskov, Trends in Metal Oxide Stability for Nanorods ,
Nanotubes , and Surfaces, The Journal of Physical Chemistry C, vol. 115,
pp. 22442252, 2011.
220 B. Seger, T. Pedersen, A. Laursen, P. Vesborg, O. Hansen, and I. Chorkendor
, Using TiO2 as a Conductive Protective Layer for Photocathodic
H2 Evolution, Journal of the American Chemical Society, vol. 135,
pp. 10571064, 2013.
221 B. Seger, D. S. Tilley, T. Pedersen, P. C. K. Vesborg, O. Hansen,
M. Grätzel, and I. Chorkendor, Silicon protected with atomic layer deposited
TiO2: durability studies of photocathodic H2 evolution, RSC
Advances, vol. 3, no. 48, pp. 2590225907, 2013.
222 B. Seger, S. D. Tilley, T. Pedersen, P. C. K. Vesborg, O. Hansen,
M. Grätzel, and I. Chorkendor, Silicon protected with atomic layer deposited
TiO2: conducting versus tunnelling through TiO2, Journal of
Materials Chemistry A, vol. 1, no. 47, pp. 1508915094, 2013.